Research graph
References from Properties, applications, hazards, and abatement technologies of chlorine trifluoride. Local targets link to admitted publications; unresolved targets remain external evidence.
Unresolved reference
2004 · External reference
Unresolved reference
2024 · External reference
Method of purification of uranium hexafluoride
1974 · External reference
Method for fluoridation of nuclear fuel by means of gaseous chlorine trifluoride
1968 · External reference
Overview of research progress on chlorine trifluoride
2020 · External reference
Density functional theory study on the fluorination reactions of silicon and silicon dioxide surfaces using different fluorine-containing species
10.1116/1.5081490 · 2019 · External reference
Process for preparing stable chlorine trifluoride dioxide
1975 · External reference
Halogen fluorides and other covalent fluorides—physical and chemical properties
10.1021/cr50023a003 · 1958 · External reference
Evidence for chlorine oxyfluoride as a primary product of the reaction of chlorine trifluoride with water
10.1016/0022-1902(72)80254-9 · 1972 · External reference
Unresolved reference
External reference
Method for purifying fluorine-containing exhaust gas
2021 · External reference
Research progress on chlorine trifluoride
1962 · External reference
Halogenation in the liquid phase by means of chlorine trifluoride
10.1039/jr9500003608 · 1950 · External reference
Study on cleaning agents for removing radioactive deposits, in: china nuclear science and technology progress report
2007 · External reference
Experimental study on energy release from the reaction of chlorine trifluoride with hydrocarbon fuels
2019 · External reference
Unresolved reference
1997 · External reference
Separation of a gas mixture containing uranium hexafluoride, hydrogen fluoride, and chlorine trifluoride
10.1007/s10512-023-01012-4 · 2023 · External reference
Etching of silicon carbide using chlorine trifluoride gas
10.1143/jjap.44.1376 · 2005 · External reference
Temperature-dependent behavior of 4H-silicon carbide surface morphology etched using chlorine trifluoride gas
2013 · External reference
The chemistry of chlorine trifluoride
1965 · External reference
Experimental study on flammability limit of a chlorine trifluoride/dichlorosilane/nitrogen mixture
2005 · External reference
Selective etching of silicon nitride over silicon oxide using chlorine trifluoride/hydrogen remote plasma
10.1038/s41598-022-09252-3 · 2022 · External reference
10.1109/memsys.2007.4433014
10.1109/memsys.2007.4433014 · External reference
Interhalogen compounds and their use as fluorinating agents
10.1002/zfch.19670070202 · 1967 · External reference
Method, treating agent, and apparatus for treating exhaust gas containing inorganic halogenated gases including chlorine trifluoride
2004 · External reference
Unresolved reference
2000 · External reference
Unresolved reference
External reference
Unresolved reference
1994 · External reference
Electrolytic fluorine production in Germany
10.1149/1.3071789 · 1947 · External reference
Unresolved reference
External reference
The preparation and properties of chlorine trifluoride
1948 · External reference
The use of chlorine trifluoride as a fluorinating agent
10.1021/ja01126a526 · 1952 · External reference
Über das Chlortrifluorid
10.1002/zaac.19301900127 · 1930 · External reference
Plasmaless etching of silicon using chlorine trifluoride
10.1116/1.585682 · 1991 · External reference
Susceptor coating materials applicable for silicon carbide reactor cleaning
10.4028/www.scientific.net/msf.897.99 · 2017 · External reference
Physical and chemical properties of halogen fluorides
1967 · External reference
Lowest concentration of chlorine trifluoride gas for cleaning silicon carbide chemical vapor deposition reactor
10.1149/2162-8777/ac889d · 2022 · External reference
Preparation of chlorine trifluoride and its reaction properties
2000 · External reference
Environmental and health risks of chlorine trifluoride (chlorine trifluoride), an alternative to potent greenhouse gases in the semiconductor industry
2011 · External reference
Method for removing chlorine trifluoride
2011 · External reference
Unresolved reference
External reference
Unresolved reference
External reference
Research progress on chlorine trifluoride electronic gas
2021 · External reference
System and method for dry cleaning processing chambers
2002 · External reference
Device and method for treating high-concentration chlorine trifluoride exhaust
2018 · External reference
Über das Chlortrifluorid
10.1002/zaac.19301900127 · ExternalCitation · doi-reference
Interhalogen compounds and their use as fluorinating agents
10.1002/zfch.19670070202 · ExternalCitation · doi-reference
Separation of a gas mixture containing uranium hexafluoride, hydrogen fluoride, and chlorine trifluoride
10.1007/s10512-023-01012-4 · ExternalCitation · doi-reference
Evidence for chlorine oxyfluoride as a primary product of the reaction of chlorine trifluoride with water
10.1016/0022-1902(72)80254-9 · ExternalCitation · doi-reference
Halogen fluorides and other covalent fluorides—physical and chemical properties
10.1021/cr50023a003 · ExternalCitation · doi-reference
The use of chlorine trifluoride as a fluorinating agent
10.1021/ja01126a526 · ExternalCitation · doi-reference
Selective etching of silicon nitride over silicon oxide using chlorine trifluoride/hydrogen remote plasma
10.1038/s41598-022-09252-3 · ExternalCitation · doi-reference
Halogenation in the liquid phase by means of chlorine trifluoride
10.1039/jr9500003608 · ExternalCitation · doi-reference
10.1109/memsys.2007.4433014
10.1109/memsys.2007.4433014 · ExternalCitation · doi-reference
Density functional theory study on the fluorination reactions of silicon and silicon dioxide surfaces using different fluorine-containing species
10.1116/1.5081490 · ExternalCitation · doi-reference
Plasmaless etching of silicon using chlorine trifluoride
10.1116/1.585682 · ExternalCitation · doi-reference
Etching of silicon carbide using chlorine trifluoride gas
10.1143/jjap.44.1376 · ExternalCitation · doi-reference
Electrolytic fluorine production in Germany
10.1149/1.3071789 · ExternalCitation · doi-reference
Lowest concentration of chlorine trifluoride gas for cleaning silicon carbide chemical vapor deposition reactor
10.1149/2162-8777/ac889d · ExternalCitation · doi-reference
Susceptor coating materials applicable for silicon carbide reactor cleaning
10.4028/www.scientific.net/msf.897.99 · ExternalCitation · doi-reference
