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References from Atomistic mechanisms of surface amorphization and sputtering in single-crystal diamond under ultra-low energy ion bombardment. Local targets link to admitted publications; unresolved targets remain external evidence.
Diamond semiconductor performances in power electronics applications
10.1016/j.diamond.2020.108154 · 2020 · External reference
Recent advances in diamond power semiconductor devices
10.1016/j.mssp.2018.01.007 · 2018 · External reference
A review of diamond materials and applications in power semiconductor devices
10.3390/ma17143437 · 2024 · External reference
CVD diamond films: from growth to applications
10.1016/s1567-1739(01)00061-x · 2001 · External reference
Surface functionalization of thin-film diamond for highly stable and selective biological interfaces
10.1073/pnas.1006660107 · 2011 · External reference
CVD diamond processing tools: a review
10.1016/j.jare.2024.09.013 · 2025 · External reference
Diamond for electronics: materials, processing and devices
10.3390/ma14227081 · 2021 · External reference
Developments of plasma etching technology for fabricating semiconductor devices
10.1143/jjap.47.1435 · 2008 · External reference
Precise patterning of organic semiconductors by reactive ion etching
10.1016/j.orgel.2019.07.015 · 2020 · External reference
Overview of atomic layer etching in the semiconductor industry
10.1116/1.4913379 · 2015 · External reference
Reactive ion etching of diamond in CF4, O2, O2 and Ar-based mixtures
10.1023/a:1017964129419 · 2001 · External reference
Etching effects of hydrogen plasma treatment on diamond surfaces
10.1016/j.surfcoat.2019.02.007 · 2019 · External reference
Etching and micro-optics fabrication in diamond using chlorine-based inductively coupled plasma
10.1016/j.diamond.2008.01.011 · 2008 · External reference
Low-energy Ar ion-induced and chlorine ion etching of silicon
10.1116/1.579924 · 1996 · External reference
Comparison of atomic scale etching of poly-Si in inductively coupled Ar and He plasmas
10.1007/s11814-007-0023-9 · 2007 · External reference
Precise characterization of atomic-scale corrosion of single crystal diamond in H2 plasma based on MEMS/NEMS
10.1016/j.corsci.2020.108651 · 2020 · External reference
Hydrogen plasma and atomic oxygen treatments of diamond: chemical versus morphological effects
10.1063/1.2939561 · 2008 · External reference
Facet and ripple formations on single crystal diamond tools machined by low energy oxygen ion beam
10.1016/j.diamond.2011.06.009 · 2011 · External reference
Deterministic nanopatterning of diamond using electron beams
10.1021/acsnano.8b00354 · 2018 · External reference
Argon atoms insertion in diamond: new insights in the identification of carbon C 1s peak in X-ray photoelectron spectroscopy analysis
10.1016/j.carbon.2018.03.053 · 2018 · External reference
Spectroscopic studies of nanocrystalline diamond materials
10.1016/j.diamond.2006.12.015 · 2007 · External reference
Application of nano-crystalline diamond in tribology
10.3390/ma16072710 · 2023 · External reference
Molecular dynamics study of amorphization and defects induced by argon ion implantation into single crystal diamond
10.1016/j.diamond.2025.112063 · 2025 · External reference
Morphological evolution mechanism of maskless diamond nanocones via Ar ion etching
10.1016/j.diamond.2025.112610 · 2025 · External reference
Nanosmoothing of single crystal diamond chips by 1 keV Ar+ ion bombardment
10.1116/1.3298885 · 2010 · External reference
Sharpening of CVD diamond coated tools by 0.5-10 keV Ar+ ion beam
10.1016/j.diamond.2011.04.008 · 2011 · External reference
Surface morphology analysis of natural single crystal diamond chips bombarded with Ar+ ion beam
10.1016/j.vacuum.2010.01.045 · 2010 · External reference
Coherent atomic-scale ripples on metallic glasses patterned by low-energy ion irradiation for large-area surface structuring
10.1021/acsanm.0c02548 · 2020 · External reference
Neon ion beam induced pattern formation on amorphous carbon surfaces
10.1063/1.5018166 · 2018 · External reference
Silicon nanocone formation via low-energy helium ion sputtering
10.1116/1.5040765 · 2018 · External reference
Evolution of plasmonic nanostructures under ultra-low-energy ion bombardment
10.1016/j.apsusc.2020.148672 · 2021 · External reference
Ion beam processing with an ultra-low energy Ar+ micro-polisher: from fundamental understanding to process optimisation
10.1016/j.apsusc.2023.158172 · 2023 · External reference
Molecular dynamics for ion beam analysis
10.1016/j.nimb.2007.11.056 · 2008 · External reference
Displacement threshold energy for type IIa diamond
10.1063/1.107267 · 1992 · External reference
Atomic scale etching of diamond: insights from molecular dynamics simulations
10.1088/1361-6463/ad78e6 · 2025 · External reference
Simulation of ion beam sputtering with SDTrimSP, TRIDYN and SRIM
10.1016/j.apsusc.2014.03.152 · 2014 · External reference
Comparison of BC and MD simulations of low-energy ion implantation
10.1016/0168-583x(95)80148-f · 1995 · External reference
ReaxFF: a reactive force field for hydrocarbons
10.1021/jp004368u · 2001 · External reference
Reactive molecular simulation of the damage mitigation efficacy of POSS-, graphene-, and carbon nanotube-loaded polyimide coatings exposed to atomic oxygen bombardment
10.1021/acsami.7b02032 · 2017 · External reference
Reactive molecular dynamics simulations of the atomic oxygen impact on epoxies with different chemistries
10.1021/acs.jpcc.9b03739 · 2019 · External reference
Direction dependent etching of diamond surfaces by hyperthermal atomic oxygen: a ReaxFF based molecular dynamics study
10.1016/j.carbon.2014.10.076 · 2015 · External reference
Development of a transferable ReaxFF parameter set for carbon- and silicon-based solid systems
10.1021/acs.jpcc.0c01645 · 2020 · External reference
Empirical potential for hydrocarbons for use in simulating the chemical vapor deposition of diamond films
10.1103/physrevb.42.9458 · 1990 · External reference
Describing bond-breaking processes by reactive potentials: importance of an environment-dependent interaction range
10.1103/physrevb.78.161402 · 2008 · External reference
Atomistic simulations of graphite etching at realistic time scales
10.1039/c7sc02763j · 2017 · External reference
Different etching mechanisms of diamond by oxygen and hydrogen plasma: a reactive molecular dynamics study
10.1021/acs.jpcc.1c03919 · 2021 · External reference
The etching mechanisms of diamond, graphite, and amorphous carbon by hydrogen plasma: a reactive molecular dynamics study
10.1002/adts.202300371 · 2023 · External reference
A second-generation reactive empirical bond order (REBO) potential energy expression for hydrocarbons
10.1088/0953-8984/14/4/312 · 2002 · External reference
Elastic constants of diamond from molecular dynamics simulations
10.1088/0953-8984/18/32/s05 · 2006 · External reference
SRIM – The stopping and range of ions in matter
10.1016/j.nimb.2010.02.091 · 2010 · External reference
Molecular dynamics simulations of cluster impacts on solid targets: implantation, surface modification, and sputtering
10.1007/s10825-013-0504-5 · 2014 · External reference
Towards a better understanding of the surface smoothing effect in gas cluster ion beam processing with molecular dynamics simulation and experiment
10.1364/oe.533111 · 2024 · External reference
Description of Short-Range Interactions of Carbon-Based Materials with a Combined AIREBO and ZBL Potential
10.3390/nano14171423 · 2024 · External reference
Theory of Auger neutralization of ions at the surface of a diamond-type semiconductor
10.1103/physrev.122.83 · 1961 · External reference
The (100), (111) and (110) surfaces of diamond: an ab initio B3LYP study
10.1080/00268976.2013.829250 · 2014 · External reference
Lattice constants from semilocal density functionals with zero-point phonon correction
2012 · External reference
First-principles study of structural, electronic and vibrational properties of heavily boron-doped diamond
10.1016/j.physleta.2009.05.008 · 2009 · External reference
LAMMPS-a flexible simulation tool for particle-based materials modeling at the atomic, meso, and continuum scales
10.1016/j.cpc.2021.108171 · 2022 · External reference
A unified formulation of the constant temperature molecular dynamics methods
10.1063/1.447334 · 1984 · External reference
Constant temperature molecular dynamics methods
10.1143/ptps.103.1 · 1991 · External reference
Canonical dynamics: equilibrium phase-space distributions
10.1103/physreva.31.1695 · 1985 · External reference
Crystal structure and pair potentials: a molecular-dynamics study
10.1103/physrevlett.45.1196 · 1980 · External reference
Polymorphic transitions in single crystals: a new molecular dynamics method
10.1063/1.328693 · 1981 · External reference
Self-guided Langevin dynamics via generalized Langevin equation
10.1002/jcc.24015 · 2016 · External reference
Visualization and analysis of atomistic simulation data with OVITO-the Open Visualization Tool
10.1088/0965-0393/18/1/015012 · 2010 · External reference
Global transition path search for dislocation formation in Ge on Si (001)
10.1016/j.cpc.2016.04.001 · 2016 · External reference
Sputter yields in diamond bombarded by ultra low energy ions
10.1016/j.apsusc.2006.02.067 · 2006 · External reference
Chemical sputtering of hydrocarbon films
10.1063/1.1594273 · 2003 · External reference
Energy dependence of ion-induced sputtering yields from monatomic solids at normal incidence, Atom Date Nucl
1996 · External reference
Low energy sputter yields for diamond, carbon]carbon composite, and molybdenum subject to xenon ion bombardment
10.1016/s0925-9635(00)00350-2 · 2000 · External reference
The etching mechanisms of diamond, graphite, and amorphous carbon by hydrogen plasma: a reactive molecular dynamics study
10.1002/adts.202300371 · ExternalCitation · doi-reference
Self-guided Langevin dynamics via generalized Langevin equation
10.1002/jcc.24015 · ExternalCitation · doi-reference
Molecular dynamics simulations of cluster impacts on solid targets: implantation, surface modification, and sputtering
10.1007/s10825-013-0504-5 · ExternalCitation · doi-reference
Comparison of atomic scale etching of poly-Si in inductively coupled Ar and He plasmas
10.1007/s11814-007-0023-9 · ExternalCitation · doi-reference
Comparison of BC and MD simulations of low-energy ion implantation
10.1016/0168-583x(95)80148-f · ExternalCitation · doi-reference
Sputter yields in diamond bombarded by ultra low energy ions
10.1016/j.apsusc.2006.02.067 · ExternalCitation · doi-reference
Simulation of ion beam sputtering with SDTrimSP, TRIDYN and SRIM
10.1016/j.apsusc.2014.03.152 · ExternalCitation · doi-reference
Evolution of plasmonic nanostructures under ultra-low-energy ion bombardment
10.1016/j.apsusc.2020.148672 · ExternalCitation · doi-reference
Ion beam processing with an ultra-low energy Ar+ micro-polisher: from fundamental understanding to process optimisation
10.1016/j.apsusc.2023.158172 · ExternalCitation · doi-reference
Direction dependent etching of diamond surfaces by hyperthermal atomic oxygen: a ReaxFF based molecular dynamics study
10.1016/j.carbon.2014.10.076 · ExternalCitation · doi-reference
Argon atoms insertion in diamond: new insights in the identification of carbon C 1s peak in X-ray photoelectron spectroscopy analysis
10.1016/j.carbon.2018.03.053 · ExternalCitation · doi-reference
Precise characterization of atomic-scale corrosion of single crystal diamond in H2 plasma based on MEMS/NEMS
10.1016/j.corsci.2020.108651 · ExternalCitation · doi-reference
Global transition path search for dislocation formation in Ge on Si (001)
10.1016/j.cpc.2016.04.001 · ExternalCitation · doi-reference
LAMMPS-a flexible simulation tool for particle-based materials modeling at the atomic, meso, and continuum scales
10.1016/j.cpc.2021.108171 · ExternalCitation · doi-reference
Spectroscopic studies of nanocrystalline diamond materials
10.1016/j.diamond.2006.12.015 · ExternalCitation · doi-reference
Etching and micro-optics fabrication in diamond using chlorine-based inductively coupled plasma
10.1016/j.diamond.2008.01.011 · ExternalCitation · doi-reference
Sharpening of CVD diamond coated tools by 0.5-10 keV Ar+ ion beam
10.1016/j.diamond.2011.04.008 · ExternalCitation · doi-reference
Facet and ripple formations on single crystal diamond tools machined by low energy oxygen ion beam
10.1016/j.diamond.2011.06.009 · ExternalCitation · doi-reference
Diamond semiconductor performances in power electronics applications
10.1016/j.diamond.2020.108154 · ExternalCitation · doi-reference
Molecular dynamics study of amorphization and defects induced by argon ion implantation into single crystal diamond
10.1016/j.diamond.2025.112063 · ExternalCitation · doi-reference
Morphological evolution mechanism of maskless diamond nanocones via Ar ion etching
10.1016/j.diamond.2025.112610 · ExternalCitation · doi-reference
CVD diamond processing tools: a review
10.1016/j.jare.2024.09.013 · ExternalCitation · doi-reference
Recent advances in diamond power semiconductor devices
10.1016/j.mssp.2018.01.007 · ExternalCitation · doi-reference
Molecular dynamics for ion beam analysis
10.1016/j.nimb.2007.11.056 · ExternalCitation · doi-reference
SRIM – The stopping and range of ions in matter
10.1016/j.nimb.2010.02.091 · ExternalCitation · doi-reference
Precise patterning of organic semiconductors by reactive ion etching
10.1016/j.orgel.2019.07.015 · ExternalCitation · doi-reference
First-principles study of structural, electronic and vibrational properties of heavily boron-doped diamond
10.1016/j.physleta.2009.05.008 · ExternalCitation · doi-reference
Etching effects of hydrogen plasma treatment on diamond surfaces
10.1016/j.surfcoat.2019.02.007 · ExternalCitation · doi-reference
Surface morphology analysis of natural single crystal diamond chips bombarded with Ar+ ion beam
10.1016/j.vacuum.2010.01.045 · ExternalCitation · doi-reference
Low energy sputter yields for diamond, carbon]carbon composite, and molybdenum subject to xenon ion bombardment
10.1016/s0925-9635(00)00350-2 · ExternalCitation · doi-reference
CVD diamond films: from growth to applications
10.1016/s1567-1739(01)00061-x · ExternalCitation · doi-reference
Development of a transferable ReaxFF parameter set for carbon- and silicon-based solid systems
10.1021/acs.jpcc.0c01645 · ExternalCitation · doi-reference
Different etching mechanisms of diamond by oxygen and hydrogen plasma: a reactive molecular dynamics study
10.1021/acs.jpcc.1c03919 · ExternalCitation · doi-reference
Reactive molecular dynamics simulations of the atomic oxygen impact on epoxies with different chemistries
10.1021/acs.jpcc.9b03739 · ExternalCitation · doi-reference
Reactive molecular simulation of the damage mitigation efficacy of POSS-, graphene-, and carbon nanotube-loaded polyimide coatings exposed to atomic oxygen bombardment
10.1021/acsami.7b02032 · ExternalCitation · doi-reference
Coherent atomic-scale ripples on metallic glasses patterned by low-energy ion irradiation for large-area surface structuring
10.1021/acsanm.0c02548 · ExternalCitation · doi-reference
Deterministic nanopatterning of diamond using electron beams
10.1021/acsnano.8b00354 · ExternalCitation · doi-reference
ReaxFF: a reactive force field for hydrocarbons
10.1021/jp004368u · ExternalCitation · doi-reference
Reactive ion etching of diamond in CF4, O2, O2 and Ar-based mixtures
10.1023/a:1017964129419 · ExternalCitation · doi-reference
Atomistic simulations of graphite etching at realistic time scales
10.1039/c7sc02763j · ExternalCitation · doi-reference
Displacement threshold energy for type IIa diamond
10.1063/1.107267 · ExternalCitation · doi-reference
Chemical sputtering of hydrocarbon films
10.1063/1.1594273 · ExternalCitation · doi-reference
Hydrogen plasma and atomic oxygen treatments of diamond: chemical versus morphological effects
10.1063/1.2939561 · ExternalCitation · doi-reference
Polymorphic transitions in single crystals: a new molecular dynamics method
10.1063/1.328693 · ExternalCitation · doi-reference
A unified formulation of the constant temperature molecular dynamics methods
10.1063/1.447334 · ExternalCitation · doi-reference
Neon ion beam induced pattern formation on amorphous carbon surfaces
10.1063/1.5018166 · ExternalCitation · doi-reference
Surface functionalization of thin-film diamond for highly stable and selective biological interfaces
10.1073/pnas.1006660107 · ExternalCitation · doi-reference
The (100), (111) and (110) surfaces of diamond: an ab initio B3LYP study
10.1080/00268976.2013.829250 · ExternalCitation · doi-reference
A second-generation reactive empirical bond order (REBO) potential energy expression for hydrocarbons
10.1088/0953-8984/14/4/312 · ExternalCitation · doi-reference
Elastic constants of diamond from molecular dynamics simulations
10.1088/0953-8984/18/32/s05 · ExternalCitation · doi-reference
Visualization and analysis of atomistic simulation data with OVITO-the Open Visualization Tool
10.1088/0965-0393/18/1/015012 · ExternalCitation · doi-reference
Atomic scale etching of diamond: insights from molecular dynamics simulations
10.1088/1361-6463/ad78e6 · ExternalCitation · doi-reference
Theory of Auger neutralization of ions at the surface of a diamond-type semiconductor
10.1103/physrev.122.83 · ExternalCitation · doi-reference
Canonical dynamics: equilibrium phase-space distributions
10.1103/physreva.31.1695 · ExternalCitation · doi-reference
Empirical potential for hydrocarbons for use in simulating the chemical vapor deposition of diamond films
10.1103/physrevb.42.9458 · ExternalCitation · doi-reference
Describing bond-breaking processes by reactive potentials: importance of an environment-dependent interaction range
10.1103/physrevb.78.161402 · ExternalCitation · doi-reference
Crystal structure and pair potentials: a molecular-dynamics study
10.1103/physrevlett.45.1196 · ExternalCitation · doi-reference
Nanosmoothing of single crystal diamond chips by 1 keV Ar+ ion bombardment
10.1116/1.3298885 · ExternalCitation · doi-reference
Overview of atomic layer etching in the semiconductor industry
10.1116/1.4913379 · ExternalCitation · doi-reference
Silicon nanocone formation via low-energy helium ion sputtering
10.1116/1.5040765 · ExternalCitation · doi-reference
Low-energy Ar ion-induced and chlorine ion etching of silicon
10.1116/1.579924 · ExternalCitation · doi-reference
Developments of plasma etching technology for fabricating semiconductor devices
10.1143/jjap.47.1435 · ExternalCitation · doi-reference
Constant temperature molecular dynamics methods
10.1143/ptps.103.1 · ExternalCitation · doi-reference
Towards a better understanding of the surface smoothing effect in gas cluster ion beam processing with molecular dynamics simulation and experiment
10.1364/oe.533111 · ExternalCitation · doi-reference
Diamond for electronics: materials, processing and devices
10.3390/ma14227081 · ExternalCitation · doi-reference
Application of nano-crystalline diamond in tribology
10.3390/ma16072710 · ExternalCitation · doi-reference
A review of diamond materials and applications in power semiconductor devices
10.3390/ma17143437 · ExternalCitation · doi-reference
Description of Short-Range Interactions of Carbon-Based Materials with a Combined AIREBO and ZBL Potential
10.3390/nano14171423 · ExternalCitation · doi-reference
