Research graph
References from Tunable Positive/Negative Tone Switching in Sn-Based Extreme Ultraviolet Lithography Dry Resists: Mechanism and Sub-7 nm Patterning. Local targets link to admitted publications; unresolved targets remain external evidence.
Recent developments in photoresists for extreme-ultraviolet lithography
10.1016/j.polymer.2023.126020 · 2023 · External reference
Review of metal-containing resists in electron beam lithography: perspectives for extreme ultraviolet patterning
10.1117/1.jmm.21.4.041402 · 2022 · External reference
Polytelluoxane as the ideal formulation for EUV photoresist
10.1126/sciadv.adx1918 · 2025 · External reference
Single-Component High-Resolution Dual-Tone EUV Photoresists Based on Precision Self-Immolative Polymers
10.1002/anie.202415588 · 2025 · External reference
Composition-controlled hafnium-based inorganic/organic hybrid dry photoresist via discrete feeding-molecular layer deposition
10.1016/j.apsusc.2026.166608 · 2026 · External reference
Atomic layer deposition and its derivatives for extreme ultraviolet (EUV) photoresist applications
10.35848/1347-4065/acce43 · 2023 · External reference
Absorption coefficient of metal-containing photoresists in the extreme ultraviolet
10.1117/1.jmm.17.2.023505 · 2018 · External reference
Water developable non-chemically amplified photoresist for electron beam and extreme ultraviolet lithography
10.1117/1.jmm.21.4.041403 · 2022 · External reference
Norbornene and Epoxide-Substituted Silsesquioxane Photoresists with High-Sensitivity and Stability
10.1021/acsnano.5c06472 · 2025 · External reference
Balancing sensitivity and resolution by feedback regulation of free radicals from Sn-C bonds in tin-oxygen clusters EBL photoresist
10.1007/s40843-024-3062-y · 2024 · External reference
Alkenyl/Thiol Co-Functionalized Titanium-Oxo Nanoclusters Enable Synergistic Lithography for Enhanced Resolution and Sensitivity
10.1021/acsnano.5c12852 · 2025 · External reference
Improving the Lithography Sensitivity of Atomically Precise Tin-Oxo Nanoclusters via Heterometal Strategy
10.1002/anie.202414360 · 2025 · External reference
Nanoparticle Photoresists from HfO2 and ZrO2 for EUV Patterning
10.2494/photopolymer.25.583 · 2012 · External reference
Chemical Modification Mechanisms in Hybrid Hafnium Oxo-methacrylate Nanocluster Photoresists for Extreme Ultraviolet Patterning
10.1021/acs.chemmater.8b03149 · 2018 · External reference
Induced Chemical Networking of Organometallic Tin in a Cyclic Framework for Sub-10 nm Patterning and Interconnect Application
10.1021/acsanm.2c04831 · 2023 · External reference
Key Role of Very Low Energy Electrons in Tin-Based Molecular Resists for Extreme Ultraviolet Nanolithography
10.1021/acsami.9b19004 · 2020 · External reference
Advanced materials for 193 nm immersion lithography
10.1002/pat.677 · 2006 · External reference
Extrusion spin coating: An efficient and deterministic photoresist coating method in microlithography
10.1109/tsm.2003.822734 · 2004 · External reference
Applications of Dry Film Photoresist in Micromachining: A Review
10.3390/mi16111258 · 2025 · External reference
Molecular Layer Deposited Aluminum-Based Hybrid Resist for High-Resolution Nanolithography and Direct Ultra-High Aspect Ratio Pattern Transfer
10.1002/admt.202501639 · 2026 · External reference
10.1117/12.2585004
10.1117/12.2585004 · 2021 · External reference
Molecular Layer Deposition of a Hafnium-Based Hybrid Thin Film as an Electron Beam Resist
10.1021/acsami.2c04092 · 2022 · External reference
Zinc-Imidazolate Films as an All-Dry Resist Technology
10.1002/adfm.202311149 · 2024 · External reference
Atomic/molecular layer deposition strategies for enhanced CO2 capture, utilisation and storage materials
10.1039/d3cs00759f · 2024 · External reference
Growth and Properties of Hybrid Organic-Inorganic Metalcone Films Using Molecular Layer Deposition Techniques
10.1002/adfm.201200370 · 2013 · External reference
Reversible High-Capacity Si Nanocomposite Anodes for Lithium-ion Batteries Enabled by Molecular Layer Deposition
10.1002/adma.201304714 · 2014 · External reference
Atomic/molecular layer deposition of cerium(iii) hybrid thin films using rigid organic precursors
10.1039/d2dt00353h · 2022 · External reference
Resolving surface chemical states in XPS analysis of first row transition metals, oxides and hydroxides: Cr, Mn, Fe, Co and Ni
10.1016/j.apsusc.2010.10.051 · 2011 · External reference
Exceptional Light Sensitivity by Thiol-Ene Click Lithography
10.1021/jacs.2c11887 · 2023 · External reference
Interface Engineering of Conjugated Polymer-Based Composites for Photocatalysis
10.1002/chem.202202593 · 2022 · External reference
High resolution XPS characterization of chemical functionalised MWCNTs and SWCNTs
10.1016/j.carbon.2004.08.033 · 2005 · External reference
Multi-metal coordination polymers grown through hybrid molecular layer deposition
10.1039/d1dt00465d · 2021 · External reference
Mild-Annealed Molecular Layer Deposition (MLD) Tincone Thin Film as Photoelectrochemically Stable and Efficient Electron Transport Layer for Si Photocathodes
10.1021/acsaem.4c02997 · 2025 · External reference
Molecular layer deposition of tin-based organic-inorganic hybrid films as photoresists
10.1016/j.apsusc.2024.162240 · 2025 · External reference
Advancing next generation nanolithography with infiltration synthesis of hybrid nanocomposite resists
10.1039/c9tc02974e · 2019 · External reference
Understanding Pattern Collapse in Photolithography Process Due to Capillary Forces
10.1021/la101521k · 2010 · External reference
32 nm pattern collapse Modeling with radial distance and rinse speed
10.1143/jjap.46.5101 · 2007 · External reference
Tracing optimized condition for electron beam metrology of EUV photoresist pattern using low landing energy
10.1117/12.2660114 · 2023 · External reference
Resist Level Critical Dimension SEM Metrology: Challenges and Developments for EUV Photomasks
10.1117/12.3073153 · 2025 · External reference
Ultra-fast etching of photoresist by reactive atmospheric-pressure thermal plasma jet with surface temperature measurement
10.35848/1882-0786/ada374 · 2025 · External reference
Necking Reduction at Low Temperature in Aspect Ratio Etching of SiO2 at CF4/H2/Ar Plasma
10.3390/nano14020209 · 2024 · External reference
Latest developments in EUV photoresist evaluation capability at Shanghai Synchrotron Radiation Facility
10.1007/s41365-023-01351-8 · 2023 · External reference
An HAXPES study of Sn, SnS, SnO and SnO2
10.1016/j.elspec.2014.07.012 · 2014 · External reference
Protocol for structure determination of unknowns by EI mass spectrometry. IV. Diagnostic ions in the mass spectra of polyfunctional compounds with hydroxyl, keto, carboxyl, mercapto and/or amine groups
10.1063/5.0255222 · 2025 · External reference
Role of low-energy electrons in the solubility switch of Zn-based oxocluster photoresist for extreme ultraviolet lithography
10.1039/d1cp02334a · 2021 · External reference
Single-oscillator model and determination of optical constants of spray pyrolyzed amorphous SnO2 thin films
10.1140/epjb/e2007-00227-y · 2007 · External reference
Solution processed amorphous gallium-incorporated tin oxide thin-film transistors
10.35848/1347-4065/ab88c0 · 2020 · External reference
Long-range corrected hybrid density functionals with damped atom-atom dispersion corrections
10.1039/b810189b · 2008 · External reference
Unresolved reference
External reference
Balanced basis sets of split valence, triple zeta valence and quadruple zeta valence quality for H to Rn: Design and assessment of accuracy
10.1039/b508541a · 2005 · External reference
Growth and Properties of Hybrid Organic-Inorganic Metalcone Films Using Molecular Layer Deposition Techniques
10.1002/adfm.201200370 · ExternalCitation · doi-reference
Zinc-Imidazolate Films as an All-Dry Resist Technology
10.1002/adfm.202311149 · ExternalCitation · doi-reference
Reversible High-Capacity Si Nanocomposite Anodes for Lithium-ion Batteries Enabled by Molecular Layer Deposition
10.1002/adma.201304714 · ExternalCitation · doi-reference
Molecular Layer Deposited Aluminum-Based Hybrid Resist for High-Resolution Nanolithography and Direct Ultra-High Aspect Ratio Pattern Transfer
10.1002/admt.202501639 · ExternalCitation · doi-reference
Improving the Lithography Sensitivity of Atomically Precise Tin-Oxo Nanoclusters via Heterometal Strategy
10.1002/anie.202414360 · ExternalCitation · doi-reference
Single-Component High-Resolution Dual-Tone EUV Photoresists Based on Precision Self-Immolative Polymers
10.1002/anie.202415588 · ExternalCitation · doi-reference
Interface Engineering of Conjugated Polymer-Based Composites for Photocatalysis
10.1002/chem.202202593 · ExternalCitation · doi-reference
Advanced materials for 193 nm immersion lithography
10.1002/pat.677 · ExternalCitation · doi-reference
Balancing sensitivity and resolution by feedback regulation of free radicals from Sn-C bonds in tin-oxygen clusters EBL photoresist
10.1007/s40843-024-3062-y · ExternalCitation · doi-reference
Latest developments in EUV photoresist evaluation capability at Shanghai Synchrotron Radiation Facility
10.1007/s41365-023-01351-8 · ExternalCitation · doi-reference
Resolving surface chemical states in XPS analysis of first row transition metals, oxides and hydroxides: Cr, Mn, Fe, Co and Ni
10.1016/j.apsusc.2010.10.051 · ExternalCitation · doi-reference
Molecular layer deposition of tin-based organic-inorganic hybrid films as photoresists
10.1016/j.apsusc.2024.162240 · ExternalCitation · doi-reference
Composition-controlled hafnium-based inorganic/organic hybrid dry photoresist via discrete feeding-molecular layer deposition
10.1016/j.apsusc.2026.166608 · ExternalCitation · doi-reference
High resolution XPS characterization of chemical functionalised MWCNTs and SWCNTs
10.1016/j.carbon.2004.08.033 · ExternalCitation · doi-reference
An HAXPES study of Sn, SnS, SnO and SnO2
10.1016/j.elspec.2014.07.012 · ExternalCitation · doi-reference
Recent developments in photoresists for extreme-ultraviolet lithography
10.1016/j.polymer.2023.126020 · ExternalCitation · doi-reference
Chemical Modification Mechanisms in Hybrid Hafnium Oxo-methacrylate Nanocluster Photoresists for Extreme Ultraviolet Patterning
10.1021/acs.chemmater.8b03149 · ExternalCitation · doi-reference
Mild-Annealed Molecular Layer Deposition (MLD) Tincone Thin Film as Photoelectrochemically Stable and Efficient Electron Transport Layer for Si Photocathodes
10.1021/acsaem.4c02997 · ExternalCitation · doi-reference
Molecular Layer Deposition of a Hafnium-Based Hybrid Thin Film as an Electron Beam Resist
10.1021/acsami.2c04092 · ExternalCitation · doi-reference
Key Role of Very Low Energy Electrons in Tin-Based Molecular Resists for Extreme Ultraviolet Nanolithography
10.1021/acsami.9b19004 · ExternalCitation · doi-reference
Induced Chemical Networking of Organometallic Tin in a Cyclic Framework for Sub-10 nm Patterning and Interconnect Application
10.1021/acsanm.2c04831 · ExternalCitation · doi-reference
Norbornene and Epoxide-Substituted Silsesquioxane Photoresists with High-Sensitivity and Stability
10.1021/acsnano.5c06472 · ExternalCitation · doi-reference
Alkenyl/Thiol Co-Functionalized Titanium-Oxo Nanoclusters Enable Synergistic Lithography for Enhanced Resolution and Sensitivity
10.1021/acsnano.5c12852 · ExternalCitation · doi-reference
Exceptional Light Sensitivity by Thiol-Ene Click Lithography
10.1021/jacs.2c11887 · ExternalCitation · doi-reference
Understanding Pattern Collapse in Photolithography Process Due to Capillary Forces
10.1021/la101521k · ExternalCitation · doi-reference
Balanced basis sets of split valence, triple zeta valence and quadruple zeta valence quality for H to Rn: Design and assessment of accuracy
10.1039/b508541a · ExternalCitation · doi-reference
Long-range corrected hybrid density functionals with damped atom-atom dispersion corrections
10.1039/b810189b · ExternalCitation · doi-reference
Advancing next generation nanolithography with infiltration synthesis of hybrid nanocomposite resists
10.1039/c9tc02974e · ExternalCitation · doi-reference
Role of low-energy electrons in the solubility switch of Zn-based oxocluster photoresist for extreme ultraviolet lithography
10.1039/d1cp02334a · ExternalCitation · doi-reference
Multi-metal coordination polymers grown through hybrid molecular layer deposition
10.1039/d1dt00465d · ExternalCitation · doi-reference
Atomic/molecular layer deposition of cerium(iii) hybrid thin films using rigid organic precursors
10.1039/d2dt00353h · ExternalCitation · doi-reference
Atomic/molecular layer deposition strategies for enhanced CO2 capture, utilisation and storage materials
10.1039/d3cs00759f · ExternalCitation · doi-reference
Protocol for structure determination of unknowns by EI mass spectrometry. IV. Diagnostic ions in the mass spectra of polyfunctional compounds with hydroxyl, keto, carboxyl, mercapto and/or amine groups
10.1063/5.0255222 · ExternalCitation · doi-reference
Extrusion spin coating: An efficient and deterministic photoresist coating method in microlithography
10.1109/tsm.2003.822734 · ExternalCitation · doi-reference
Absorption coefficient of metal-containing photoresists in the extreme ultraviolet
10.1117/1.jmm.17.2.023505 · ExternalCitation · doi-reference
Review of metal-containing resists in electron beam lithography: perspectives for extreme ultraviolet patterning
10.1117/1.jmm.21.4.041402 · ExternalCitation · doi-reference
Water developable non-chemically amplified photoresist for electron beam and extreme ultraviolet lithography
10.1117/1.jmm.21.4.041403 · ExternalCitation · doi-reference
10.1117/12.2585004
10.1117/12.2585004 · ExternalCitation · doi-reference
Tracing optimized condition for electron beam metrology of EUV photoresist pattern using low landing energy
10.1117/12.2660114 · ExternalCitation · doi-reference
Resist Level Critical Dimension SEM Metrology: Challenges and Developments for EUV Photomasks
10.1117/12.3073153 · ExternalCitation · doi-reference
Polytelluoxane as the ideal formulation for EUV photoresist
10.1126/sciadv.adx1918 · ExternalCitation · doi-reference
Single-oscillator model and determination of optical constants of spray pyrolyzed amorphous SnO2 thin films
10.1140/epjb/e2007-00227-y · ExternalCitation · doi-reference
32 nm pattern collapse Modeling with radial distance and rinse speed
10.1143/jjap.46.5101 · ExternalCitation · doi-reference
Nanoparticle Photoresists from HfO2 and ZrO2 for EUV Patterning
10.2494/photopolymer.25.583 · ExternalCitation · doi-reference
Applications of Dry Film Photoresist in Micromachining: A Review
10.3390/mi16111258 · ExternalCitation · doi-reference
Necking Reduction at Low Temperature in Aspect Ratio Etching of SiO2 at CF4/H2/Ar Plasma
10.3390/nano14020209 · ExternalCitation · doi-reference
Solution processed amorphous gallium-incorporated tin oxide thin-film transistors
10.35848/1347-4065/ab88c0 · ExternalCitation · doi-reference
Atomic layer deposition and its derivatives for extreme ultraviolet (EUV) photoresist applications
10.35848/1347-4065/acce43 · ExternalCitation · doi-reference
Ultra-fast etching of photoresist by reactive atmospheric-pressure thermal plasma jet with surface temperature measurement
10.35848/1882-0786/ada374 · ExternalCitation · doi-reference
