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References from Etching Efficiency for Si and SiO2 by CF+x, F+, and C+ Ion Beams Extracted from CF4 Plasmas. Local targets link to admitted publications; unresolved targets remain external evidence.
Unresolved reference
1994 · External reference
10.1116/1.586925
10.1116/1.586925 · 1993 · External reference
10.1116/1.580692
10.1116/1.580692 · 1997 · External reference
10.1063/1.358928
10.1063/1.358928 · 1995 · External reference
10.1143/jjap.33.2133
10.1143/jjap.33.2133 · 1994 · External reference
10.1116/1.588702
10.1116/1.588702 · 1996 · External reference
10.1116/1.578540
10.1116/1.578540 · 1993 · External reference
10.1143/jjap.36.1282
10.1143/jjap.36.1282 · 1997 · External reference
10.1063/1.110518
10.1063/1.110518 · 1993 · External reference
10.1063/1.331021
10.1063/1.331021 · 1982 · External reference
10.1063/1.366298
10.1063/1.366298 · 1997 · External reference
10.1063/1.366495
10.1063/1.366495 · 1997 · External reference
10.1116/1.569958
10.1116/1.569958 · 1979 · External reference
Unresolved reference
1980 · External reference
10.1143/jjap.20.l411
10.1143/jjap.20.l411 · 1981 · External reference
