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References from A self‐tuning run‐by‐run process controller for processes subject to random disturbances. Local targets link to admitted publications; unresolved targets remain external evidence.
10.1109/3476.558560
10.1109/3476.558560 · External reference
Unresolved reference
1976 · External reference
10.1080/15458830.1996.11770756
10.1080/15458830.1996.11770756 · External reference
10.1080/00224065.1997.11979749
10.1080/00224065.1997.11979749 · External reference
10.1080/00224065.1986.11979014
10.1080/00224065.1986.11979014 · External reference
10.1080/00224065.1993.11979473
10.1080/00224065.1993.11979473 · External reference
10.1080/00401706.1990.10484583
10.1080/00401706.1990.10484583 · External reference
“Adaptive Extensions to a Multi‐Branch Run‐to‐Run Controller for Plasma Etching,”
1995 · External reference
10.1109/66.311345
10.1109/66.311345 · External reference
10.1109/66.350755
10.1109/66.350755 · External reference
10.1109/3476.622882
10.1109/3476.622882 · External reference
10.1109/66.670176
10.1109/66.670176 · External reference
10.1109/66.536109
10.1109/66.536109 · External reference
10.1109/3476.484201
10.1109/3476.484201 · External reference
10.1080/00401706.1995.10484337
10.1080/00401706.1995.10484337 · External reference
Unresolved reference
External reference
