Research graph
References from Characterization of EUV masks multilayer defect based on neural networks and dark-field microscopy. Local targets link to admitted publications; unresolved targets remain external evidence.
0.33 NA EUV systems for high volume manufacturing
2023 · External reference
10.1116/1.3244624
10.1116/1.3244624 · 2009 · External reference
10.1515/aot-2017-0017
10.1515/aot-2017-0017 · 2017 · External reference
10.1364/oe.574817
10.1364/oe.574817 · 2025 · External reference
10.1117/1.jmm.13.4.043006
10.1117/1.jmm.13.4.043006 · 2014 · External reference
Modeling strategies for EUV mask multilayer defect dispositioning and repair
2013 · External reference
EUV mask blank defect avoidance solutions assessment
2012 · External reference
Compensation for EUV multilayer defects within arbitrary layouts by absorber pattern modification
2011 · External reference
Printability of native blank defects and programmed defects and their stack structures
2011 · External reference
Electron beam inspection of 16 nm HP node EUV masks
2012 · External reference
Applicability of e-beam mask inspection to EUV mask production
2012 · External reference
Performance of EBeyeM for EUV mask inspection
2011 · External reference
Unresolved reference
2025 · External reference
High-speed actinic EUV mask blank inspection with dark-field imaging
2004 · External reference
The capability of high magnification review function for EUV actinic blank inspection tool
2013 · External reference
10.1143/jjap.49.06gd02
10.1143/jjap.49.06gd02 · 2010 · External reference
Detection signal analysis of actinic inspection of EUV mask blanks using dark-field imaging
2006 · External reference
EUV actinic blank inspection tool with a high magnification review mode
2012 · External reference
Phase defect analysis with actinic full-field EUVL mask blank inspection
2011 · External reference
10.1117/1.jmm.15.1.014002
10.1117/1.jmm.15.1.014002 · 2016 · External reference
10.1364/oe.394590
10.1364/oe.394590 · 2020 · External reference
10.1364/ao.425941
10.1364/ao.425941 · 2021 · External reference
10.1364/ao.480356
10.1364/ao.480356 · 2023 · External reference
10.1364/ao.547591
10.1364/ao.547591 · 2025 · External reference
10.1364/ao.399323
10.1364/ao.399323 · 2020 · External reference
10.1364/ao.458059
10.1364/ao.458059 · 2022 · External reference
10.1364/oe.432010
10.1364/oe.432010 · 2021 · External reference
Defect analysis on actinic blank inspection tool
2014 · External reference
Smoothing of substrate pits using ion beam deposition for EUV lithography
2012 · External reference
Unresolved reference
2005 · External reference
10.1143/jjap.45.5359
10.1143/jjap.45.5359 · 2006 · External reference
Unresolved reference
2021 · External reference
