Research graph
References from Defect-free removal of monocrystalline germanium. Local targets link to admitted publications; unresolved targets remain external evidence.
Sweet-spot operation of a germanium hole spin qubit with highly anisotropic noise sensitivity
10.1038/s41563-024-01857-5 · 2024 · External reference
Direct-bandgap emission from hexagonal Ge and SiGe alloys
10.1038/s41586-020-2150-y · 2020 · External reference
Room-temperature waveguide-integrated photodetector using bolometric effect for mid-infrared spectroscopy applications
10.1038/s41377-025-01803-3 · 2025 · External reference
Quantum confinement-tunable solar cell based on ultrathin amorphous germanium
10.1016/j.nanoen.2020.105048 · 2020 · External reference
New structure transistors for advanced technology node CMOS ICs
10.1093/nsr/nwae008 · 2024 · External reference
Germanium nanocrystal non-volatile memory devices: Fabrication, charge storage mechanism and characterization
10.1039/d4nr05159a · 2025 · External reference
Controlling etch anisotropy of crystalline germanium nanostructures
10.1002/smll.202504357 · 2025 · External reference
Interfacial mechanical and tribochemical effects on friction mechanisms under air or vacuum conditions
10.26599/frict.2025.9441056 · 2025 · External reference
Fundamental investigation of chemical mechanical polishing of GaAs in silica dispersions: Material removal and arsenic trihydride formation pathways
10.1149/2.008311jss · 2013 · External reference
Recent developments and applications of chemical mechanical polishing
10.1007/s00170-020-05740-w · 2020 · External reference
Role of friction in tribofilm formation: Tribochemical evolution of proteins under AFM single-asperity friction
10.26599/frict.2025.9441073 · 2025 · External reference
Mechanical origin of Amonton’s law in nanoscale friction
10.26599/frict.2025.9441129 · 2026 · External reference
Study on the influence of ambient temperature on surface/subsurface damage of monocrystalline germanium lapping wafer
10.1016/j.procir.2018.05.053 · 2018 · External reference
Coplanar integration of lattice-mismatched semiconductors with silicon by wafer bonding Ge/Si1–xGex/Si virtual substrates
10.1149/1.1757462 · 2004 · External reference
Effect of potassium periodate oxidizer on germanium chemical mechanical planarization using fumed silica as abrasive
10.1149/2.0151905jss · 2019 · External reference
Chemical mechanical polishing of Ge using colloidal silica particles and H2O2
10.1149/1.3575166 · 2011 · External reference
Chemical mechanical polishing of epitaxial germanium on SiO2-patterned Si (001) substrates
10.1149/1.2986777 · 2008 · External reference
Chemical mechanical planarization of germanium using oxone® based silica slurries
10.1016/j.wear.2016.11.030 · 2017 · External reference
Investigation of chemical tooth mechanism in chemical mechanical planarization of germanium
10.1016/j.triboint.2017.03.029 · 2017 · External reference
Role of interfacial water in adhesion, friction, and wear: A critical review
10.1007/s40544-020-0425-4 · 2021 · External reference
Boundary slip and lubrication mechanisms of organic friction modifiers with effect of surface moisture
10.1007/s40544-023-0820-0 · 2024 · External reference
Novel polyelectrolyte–Al2O3/SiO2 composite nanoabrasives for improved chemical mechanical polishing (CMP) of sapphire
10.1557/jmr.2018.443 · 2019 · External reference
Effect of counter-surface chemical activity on mechanochemical removal of GaAs surface
10.1016/j.triboint.2022.107928 · 2022 · External reference
Germanium surface cleaning with hydrochloric acid
10.1149/1.2355913 · 2006 · External reference
Effects of crystallographic orientation and negative rake angle on the brittle-ductile transition and subsurface deformation in machining of monocrystalline germanium
10.1016/j.precisioneng.2018.11.011 · 2019 · External reference
The hardness of silicon and germanium
10.1016/j.actamat.2007.07.036 · 2007 · External reference
Crystallographic anisotropy-dependent mechanochemical removal of GaAs: Nanoasperity experiments and atomistic simulations
10.1016/j.triboint.2024.110286 · 2025 · External reference
Effect of counter-surface chemistry on defect-free material removal of monocrystalline silicon
10.1016/j.wear.2019.01.093 · 2019 · External reference
10.1016/j.wear.2022.204270
10.1016/j.wear.2022.204270 · External reference
Toward controllable wet etching of monocrystalline silicon: Roles of mechanically driven defects
10.1021/acsami.2c04299 · 2022 · External reference
Stable functionalization of germanium surface and its application in biomolecules immobilization
10.1016/j.apsusc.2014.07.127 · 2014 · External reference
Enhancement of thermal stability and water resistance in yttrium-doped GeO2/Ge gate stack
10.1063/1.4868032 · 2014 · External reference
Removal mechanism and surface quality of crystal semiconductor materials in scratching tests with Berkovich indenter
10.1016/j.mssp.2019.104746 · 2020 · External reference
Dynamic interactions between non-screw dislocations and stacking faults during in situ straining in a TEM
10.1016/j.matchar.2019.01.004 · 2019 · External reference
Effect of alkaline agent in colloidal silica slurry for polycrystalline silicon chemical mechanical polishing
10.1143/jjap.46.5089 · 2007 · External reference
Chemical mechanical polishing of Ge in hydrogen peroxide-based silica slurries: Role of ionic strength
10.1149/2.055111jes · 2011 · External reference
Charge redistribution in mechanochemical reactions for solid interfaces
10.1021/acs.nanolett.4c00457 · 2024 · External reference
Activation and mechanochemical breaking of C–C bonds initiate wear of diamond (110) surfaces in contact with silica
10.1016/j.carbon.2015.10.098 · 2016 · External reference
