Abstract
Abstract
An industrial‐scale pulsed plasma‐assisted chemical vapor deposition (PACVD) process for crystalline alumina growth was developed. To obtain a homogeneous coating thickness distribution over complex geometries and large dimensions, a suitable gas injection system was designed. A phase formation diagram for alumina coatings as a function of pulse length and cathode voltage has been compiled, allowing for the deposition of dense α/γ‐Al2O3 coatings at a substrate temperature of 590 °C. Moulds coated with an α/γ‐Al2O3 coating were utilized in steel thixocasting at temperatures of ∼1400 °C. The coatings were intact after thixocasting and showed significantly improved chemical wear resistance compared to plain steel moulds.