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Jiajia Cao, Zhisong Li
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Application of Mueller polarimetry in conical diffraction for critical dimension measurements in microelectronics
10.1364/ao.45.003688 · 2006
Characterization of polymeric thin films for photovoltaic applications by spectroscopic ellipsometry
10.1016/j.apsusc.2015.05.027 · 2015
Use of polar decomposition of Mueller matrices for optimizing the phase response of a liquid-crystal-on-silicon display
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The origins of polarimetric image contrast between healthy and cancerous human colon tissue
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Large-area synthesis of high-quality and uniform graphene films on copper foils
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Liquid exfoliation of layered materials
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Resolving the optical anisotropy of low-symmetry 2D materials
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Highly In-plane optical and electrical anisotropy of 2D germanium arsenide
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Remarkable electronic and optical anisotropy of layered 1T'-WTe2 2D materials
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Spectroscopic ellipsometry and polarimetry for materials and systems analysis at the nanometer scale: state-of-the-art, potential, and perspectives
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Multichannel Mueller matrix ellipsometer based on the dual rotating compensator principle
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Dual rotating compensator ellipsometry: theory and simulations
10.1016/j.tsf.2010.11.075 · 2011
Accurate characterization of nanoimprinted resist patterns using Mueller matrix ellipsometry
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Experimental study of thickness dependence of polarization and depolarization properties of anisotropic turbid media using Mueller matrix polarimetry and differential decomposition
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Development of a spectroscopic Mueller matrix imaging ellipsometer for nanostructure metrology
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2014
Advanced Mueller matrix ellipsometry: instrumentation and emerging applications
10.1007/s11431-022-2090-4 · 2022
Formulation of error propagation and estimation in grating reconstruction by a dual-rotating compensator Mueller matrix polarimeter
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Second-order systematic errors in Mueller matrix dual rotating compensator ellipsometry
10.1364/ao.49.003250 · 2010
Error analysis of the calibration of a dual-rotating-retarder Mueller matrix polarimeter
10.1364/ao.56.007067 · 2017
Random error analysis of normalized fourier coefficient in dual-rotating compensator Mueller matrix ellipsometer
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Error analysis for repeatability enhancement of a dual-rotation Mueller matrix ellipsometer
2021
Error correction for Mueller matrix ellipsometry based on a reference optical path
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Modeling and application of compensator depolarization effects in Mueller matrix ellipsometer
10.1016/j.optlastec.2026.114940 · 2026
Optimization of retardance for a complete Stokes polarimeter
10.1364/ol.25.000802 · 2000
Optimization of a dual-rotating-retarder Mueller matrix polarimeter
10.1364/ao.41.002488 · 2002
Design of optimal polarimeters: maximization of signal-to-noise ratio and minimization of systematic error
10.1364/ao.41.000619 · 2002
Optimization of Mueller matrix polarimeters in the presence of error sources
10.1364/oe.16.011589 · 2008
Optimal configuration for the dual rotating-compensator Mueller matrix ellipsometer
2013
Development of a broadband Mueller matrix ellipsometer as a powerful tool for nanostructure metrology
10.1016/j.tsf.2015.02.006 · 2015
Dual rotating-compensator multichannel ellipsometer: instrument design for real-time Mueller matrix spectroscopy of surfaces and films
10.1364/josaa.16.001997 · 1999
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Unresolved referenced work
Kept as external metadata until matched
Signal-dependent noise modeling and model parameter estimation in hyperspectral images
10.1109/tgrs.2011.2110657 · 2011
MMSE filtering of generalised signal-dependent noise in spatial and shift-invariant wavelet domains
10.1016/j.sigpro.2005.10.014 · 2006
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2016
MMSE filtering of generalised signal-dependent noise in spatial and shift-invariant wavelet domains
10.1016/j.sigpro.2005.10.014 · doi-reference
Signal-dependent noise modeling and model parameter estimation in hyperspectral images
10.1109/tgrs.2011.2110657 · doi-reference
10.1002/9780470060193
10.1002/9780470060193 · doi-reference
Dual rotating-compensator multichannel ellipsometer: instrument design for real-time Mueller matrix spectroscopy of surfaces and films
10.1364/josaa.16.001997 · doi-reference
Development of a broadband Mueller matrix ellipsometer as a powerful tool for nanostructure metrology
10.1016/j.tsf.2015.02.006 · doi-reference
Optimization of Mueller matrix polarimeters in the presence of error sources
10.1364/oe.16.011589 · doi-reference
Design of optimal polarimeters: maximization of signal-to-noise ratio and minimization of systematic error
10.1364/ao.41.000619 · doi-reference
Optimization of a dual-rotating-retarder Mueller matrix polarimeter
10.1364/ao.41.002488 · doi-reference
Optimization of retardance for a complete Stokes polarimeter
10.1364/ol.25.000802 · doi-reference
Modeling and application of compensator depolarization effects in Mueller matrix ellipsometer
10.1016/j.optlastec.2026.114940 · doi-reference
Error correction for Mueller matrix ellipsometry based on a reference optical path
10.1364/ao.476005 · doi-reference
Random error analysis of normalized fourier coefficient in dual-rotating compensator Mueller matrix ellipsometer
10.1088/1361-6501/ac1a80 · doi-reference
Error analysis of the calibration of a dual-rotating-retarder Mueller matrix polarimeter
10.1364/ao.56.007067 · doi-reference
Second-order systematic errors in Mueller matrix dual rotating compensator ellipsometry
10.1364/ao.49.003250 · doi-reference
Formulation of error propagation and estimation in grating reconstruction by a dual-rotating compensator Mueller matrix polarimeter
10.1016/j.tsf.2014.01.049 · doi-reference
Advanced Mueller matrix ellipsometry: instrumentation and emerging applications
10.1007/s11431-022-2090-4 · doi-reference
Development of a spectroscopic Mueller matrix imaging ellipsometer for nanostructure metrology
10.1063/1.4952385 · doi-reference
Experimental study of thickness dependence of polarization and depolarization properties of anisotropic turbid media using Mueller matrix polarimetry and differential decomposition
10.1016/j.apsusc.2017.01.099 · doi-reference
Accurate characterization of nanoimprinted resist patterns using Mueller matrix ellipsometry
10.1364/oe.22.015165 · doi-reference
Dual rotating compensator ellipsometry: theory and simulations
10.1016/j.tsf.2010.11.075 · doi-reference
Multichannel Mueller matrix ellipsometer based on the dual rotating compensator principle
10.1016/j.tsf.2003.11.191 · doi-reference
Spectroscopic ellipsometry and polarimetry for materials and systems analysis at the nanometer scale: state-of-the-art, potential, and perspectives
10.1007/s11051-009-9662-6 · doi-reference
10.1007/3-540-27488-x
10.1007/3-540-27488-x · doi-reference
Remarkable electronic and optical anisotropy of layered 1T'-WTe2 2D materials
10.3762/bjnano.10.170 · doi-reference
Highly In-plane optical and electrical anisotropy of 2D germanium arsenide
10.1002/adfm.201707379 · doi-reference
Resolving the optical anisotropy of low-symmetry 2D materials
10.1039/c7nr09173g · doi-reference
Liquid exfoliation of layered materials
10.1126/science.1226419 · doi-reference
Large-area synthesis of high-quality and uniform graphene films on copper foils
10.1126/science.1171245 · doi-reference
The origins of polarimetric image contrast between healthy and cancerous human colon tissue
10.1063/1.4811414 · doi-reference
Use of polar decomposition of Mueller matrices for optimizing the phase response of a liquid-crystal-on-silicon display
10.1364/oe.16.001965 · doi-reference
Characterization of polymeric thin films for photovoltaic applications by spectroscopic ellipsometry
10.1016/j.apsusc.2015.05.027 · doi-reference
Application of Mueller polarimetry in conical diffraction for critical dimension measurements in microelectronics
10.1364/ao.45.003688 · doi-reference