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Oxidative Conversion of PFC via Plasma Processing with Dielectric Barrier Discharges | ResearchHub

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Oxidative Conversion of PFC via Plasma Processing with Dielectric Barrier Discharges

Verified recordOpen access

Oxidative Conversion of PFC via Plasma Processing with Dielectric Barrier Discharges

Shen Jen Yu, Moo Been Chang

Plasma Chemistry and Plasma Processing2001doi:10.1023/a:1011066208188

Abstract

No public abstract is available from the verified source records.

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Citations: 0
Reference records: 16
Views: 0
Evidence sources: crossrefunpaywalldatacite

Authors

Shen Jen Yu#1 Moo Been Chang#2

Institutions

No ROR-resolved institution is linked to this work yet.

Provenance

crossref

Confidence 100%

unpaywall

Confidence 95%

datacite

Confidence 0%

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External reference records

Unresolved referenced work

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Unresolved referenced work

1998

Unresolved referenced work

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10.1021/es9706514

10.1021/es9706514 · 1998

10.1021/es9805472

10.1021/es9805472 · 1999

Unresolved referenced work

Kept as external metadata until matched

10.1021/es980533w

10.1021/es980533w · 1998

10.1063/1.370711

10.1063/1.370711 · 1999

Unresolved referenced work

Kept as external metadata until matched

10.1063/1.366111

10.1063/1.366111 · 1997

Unresolved referenced work

1992

10.1002/(sici)1097-4660(199812)73:43.0.co;2-0

10.1002/(sici)1097-4660(199812)73:4<432::aid-jctb972>3.0.co;2-0 · 1998

Additional external references

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